2013-01 | Detection of Single Nucleotide Polymorphisms Using a Biosensor-Containing Titanium-Well Array | 박진구 |
2013-02 | Development of CO2 gas cluster cleaning method and its characterization | 박진구 |
2015-08 | Dimensionally controlled complex 3D sub-micron pattern fabrication by single step dual diffuser lithography (DDL) | 박진구 |
2011-10 | Effect of Acoustic Cavitation on Dissolved Gases and Their Characterization During Megasonic Cleaning | 박진구 |
2012-06 | Effect of Alkaline pH on Polishing and Etching of Single and Polycrystalline Silicon | 박진구 |
2014-02 | Effect of dissolved gases in water on acoustic cavitation and bubble growth rate in 0.83 MHz megasonic of interest to wafer cleaning | 박진구 |
2016-10 | Effect of Feature Spacing When Injection Molding Parts With Microstructured Surfaces | 박진구 |
2015-01 | Effect of FOUP atmosphere control on process wafer integrity in sub20nm device fabrication | 박진구 |
2014-05 | Effect of La doping of ceria abrasives for STI CMP | 박진구 |
2015-02 | Effect of lanthanum doping in ceria abrasives on chemical mechanical polishing selectivity for shallow trench isolation | 박진구 |
2018-10 | Effect of organic acids in dilute HF solutions on removal of metal contaminants on silicon wafer | 박진구 |
2015-10 | Effect of Particle Contamination on Extreme Ultraviolet (EUV) Mask and Megasonic Cleaning Process for Its Removal | 박진구 |
2016-05 | Effect of pH and chemical mechanical planarization process conditions on the copper-benzotriazole complex formation | 박진구 |
2011-10 | Effect of Pump Pulsation on Particle Contamination on Wafer Surface in Wet Cleaning System | 박진구 |
2011-01 | Effect of Rinse Process on Removal of Crown Type Defects during Photoresist Development | 박진구 |
2011-01 | Effect of Rinse Process on Removal of Crown Type Defects during Photoresist Development | 박진구 |
2014-01 | Effect of Silicon Dioxide Hardness on Scratches in Interlevel Dielectric Chemical-Mechanical Polishing | 박진구 |
2012-08 | Effective Carbon Contaminant Cleaning Condition Using Ozone Dissolved Water and Megasonic for Ru-Capped Extreme Ultraviolet Lithography Mask | 박진구 |
2012-04 | Effects of Interfacial Strength and Dimension of Structures on Physical Cleaning Window | 박진구 |
2011-11 | Electrochemical Characterization of Anti-Corrosion Film Coated Metal Conditioner Surfaces for Tungsten CMP Applications | 박진구 |
2011-10 | Electrochemical Impedance Spectroscopy (EIS) Analysis of BTA Removal by TMAH during Post Cu CMP Cleaning Process | 박진구 |
2012-08 | Electrochemical Impedance Spectroscopy (EIS) Analysis of BTA Removal by TMAH during Post Cu CMP Cleaning Process | 박진구 |
2011-06 | Enhanced Fluorescence by Controlled Surface Roughness of Plastic Biochip | 박진구 |
2011-04 | Enhancement of airborne shock wave by laser-induced breakdown of liquid column in laser shock cleaning | 박진구 |
2013-04 | Evaluation of double sided lapping using a fixed abrasive pad for sapphire substrates | 박진구 |
2013-01 | Evaluation of very dilute alkaline solutions for wafer cleaning with megasonic irradiation | 박진구 |
2013-08 | Fabrication of 3D micro structure by dual diffuser lithography | 박진구 |
2012-03 | Fabrication of a hydrophobic/hydrophilic hybrid-patterned microarray chip and its application to a cancer marker immunoassay | 박진구 |
2018-04 | Fabrication of high performance copper-resin lapping plate for sapphire: A combined 2-body and 3-body diamond abrasive wear on sapphire | 박진구 |
2016-06 | Fabrication of hydrophobic/hydrophilic switchable aluminum surface using poly(N-isopropylacrylamide) | 박진구 |