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Electrochemical Impedance Spectroscopy (EIS) Analysis of BTA Removal by TMAH during Post Cu CMP Cleaning Process

Title
Electrochemical Impedance Spectroscopy (EIS) Analysis of BTA Removal by TMAH during Post Cu CMP Cleaning Process
Author
박진구
Keywords
CHEMICAL-MECHANICAL PLANARIZATION; COPPER; BENZOTRIAZOLE; SURFACE; ENVIRONMENTS; OXIDATION; CORROSION; ALLOYS; SLURRY; FILMS
Issue Date
2011-10
Publisher
ELECTROCHEMICAL SOC INC, 65 SOUTH MAIN STREET, PENNINGTON, NJ 08534 USA
Citation
JOURNAL OF THE ELECTROCHEMICAL SOCIETY; 2012, 159(11), C447-C452
Abstract
An ex situ electrochemical impedance spectroscopy (EIS) method is used to evaluate the effectiveness of tetramethyl ammonium hydroxide (TMAH) in removing benzotriazole (BTA) layer from Cu surface after chemical mechanical polishing (CMP). Since the in situ EIS measurements could not be applied to characterize the cleaning process, ex situ EIS measurement is used in the present work. The impedance data are modeled by electrical equivalent circuit (EEC) analysis and the polarization resistance values are calculated. The BTA removal for various concentrations of TMAH is quantified from polarization resistance values. Scanning electron microscopy and X-ray photoelectron spectroscopy measurements were also conducted to complement the studies. The results show TMAH is effective in removing the BTA layer and that when part of the BTA is removed, the residual BTA appears as nodules. Some of the native oxides and hydroxides on the Cu surface are also removed by TMAH. When the slurry contains 0.1% (wt) BTA, a minimum concentration of 0.5% (wt) TMAH and a minimum cleaning time of 60 s are required for complete removal of BTA from the Cu surface. The suggested ex situ EIS technique is sensitive in evaluating removal efficiency of the organic contaminant from the metallic surface. (C) 2012 The Electrochemical Society. [DOI: 10.1149/2.014211jes] All rights reserved.
URI
http://jes.ecsdl.org/content/159/11/C447.shorthttp://hdl.handle.net/20.500.11754/38113
ISSN
0013-4651
DOI
10.1149/1.3630860
Appears in Collections:
GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
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