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Fabrication of 3D micro structure by dual diffuser lithography

Title
Fabrication of 3D micro structure by dual diffuser lithography
Other Titles
듀얼 디퓨저 리소그래피를 이용한 3 차원 마이크로 구조의 제작
Author
박진구
Keywords
3D micro structure; dual diffuser; diffuser lithography; ground glass diffuser; opal glass diffuser
Issue Date
2013-08
Publisher
The Materials Research Society of Korea
Citation
Korean Journal of Materials Research, 2013, 23(8), P.447-452, 6P.
Abstract
Recently, products that a have 3-dimensional(3D) micro structure have been in wide use. To fabricate these 3Dmicro structures, several methods, such as stereo lithography, reflow process, and diffuser lithography, have been used. However,these methods are either very complicated, have limitations in terms of patterns dimensions or need expensive components. Toovercome these limitations, we fabricated various 3D micro structures in one step using a pair of diffusers that diffract theincident beam of UV light at wide angles. In the experiment, we used positive photoresist to coat the Si substrate. A pair ofdiffusers(ground glass diffuser, opal glass diffuser) with Gaussian and Lambertian scattering was placed above the photomaskin the passage of UV light in the photolithography equipment. The incident rays of UV light diffracted twice at wider angleswhile passing through the diffusers. After exposure, the photoresist was developed fabricating the desired 3D micro structure.These micro structures were analyzed using FE-SEM and 3D-profiler data. As a result, this dual diffuser lithography(DDL)technique enabled us to fabricate various microstructures with different dimensions by just changing the combination ofdiffusers, making this technology an efficient alternative to other complex techniques.
URI
http://koreascience.or.kr/article/ArticleFullRecord.jsp?cn=GJRHBQ_2013_v23n8_447
ISSN
1225-0562
DOI
10.3740/MRSK.2013.23.8.447
Appears in Collections:
GRADUATE SCHOOL[S](대학원) > BIONANOTECHNOLOGY(바이오나노학과) > Articles
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