| 2002-06 | Sensitivity of Simulation Parameter for Critical DimensionSensitivity of Simulation Parameter for Critical DimensionSensitivity of Simulation Parameter for Critical DimensionSensitivity of Simulation Parameter for Critical Dimension | 오혜근 |
| 2004-05 | Simple 157-nm interference illumination system for pattern formation | 오혜근 |
| 2003-02 | A Simple Optical System Parameter Optimization Method by Comparing the Critical Dimension | 오혜근 |
| 2004-04 | Simulation benchmarking for the whole resist process | 오혜근 |
| 2003-02 | Simulation of Complex Resist Pattern Collapse with Mechanical Modeling | 오혜근 |
| 2006-02 | Simulation of mask induced polarization effect on imaging in immersion lithography | 오혜근 |
| 2006-07 | Simulation of rectangular isolated pattern images by applying phase shift masks in high-exposure gaps to protect LCD photo masks | 오혜근 |
| 2005-05 | Simulation of thermal resist flow process | 오혜근 |
| 2003-11 | Simulation Parameter Extraction Using Distribution Processing and Fast SEM Profile Digitization | 오혜근 |
| 2005-11 | Simulator for resist-reflow process by boundary movement | 오혜근 |
| 2006-12 | Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography | 오혜근 |
| 2003-05 | A single zone azimuth calibration for rotating compensator multichannel ellipsometry | 오혜근 |
| 2000-02 | Soft bake effect in 193-nm chemically amplified resist | 오혜근 |
| 2008-11 | Solving the Navier-Stokes Equation for Thermal Reflow | 오혜근 |
| 2016-03 | Stress-induced pellicle analysis for extreme-ultraviolet lithography | 오혜근 |
| 2008-02 | The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect( | 오혜근 |
| 2004-11 | A study of process parameter control for nanopattern | 오혜근 |
| 2007-01 | Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL) | 오혜근 |
| 2017-02 | Thermal analysis of extreme ultraviolet pellicle with metallic coatings | 오혜근 |
| 2017-12 | thermo-optical optimization of extreme-ultraviolet pellicles for future generations | 오혜근 |
| 2021-02 | Thermomechanical stability evaluation of various pellicle structures with contaminant particles | 오혜근 |
| 2001-07 | Thickness Reduction Effect in a Chemically amplified Resist Simulator | 오혜근 |
| 2001-07 | Thickness Reduction Effect in Chemically Amplified Resist Simulator | 오혜근 |
| 2002-11 | Threshold Energy Resist Model for CD Prediction | 오혜근 |
| 2003-06 | Threshold energy resist model for critical dimension prediction | 오혜근 |
| 2016-06 | Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle | 오혜근 |
| 2016-03 | Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle | 오혜근 |
| 2003-02 | Use of Rotating Compensator Spectroscopic Ellipsometry for Monitoring the Photoresist Etching on Si Wafer | 오혜근 |
| 2007-09 | Which Mask is Preferred for Sub-60 nm Node Imaging? | 오혜근 |
| 2000-02 | 감광제 고유의 ABC 노광변수 추출 시뮬레이터 | 오혜근 |
