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Thermal analysis of extreme ultraviolet pellicle with metallic coatings

Title
Thermal analysis of extreme ultraviolet pellicle with metallic coatings
Author
오혜근
Keywords
LITHOGRAPHY
Issue Date
2017-02
Publisher
ELSEVIER SCIENCE BV
Citation
MICROELECTRONIC ENGINEERING, v. 177, Page. 74-77
Abstract
In extreme ultraviolet lithography (EUVL), using the pellicle is one of the solution that can mitigate the defects on the mask focal plane. However, the high absorption at the EUV wavelength region leads to thermal damage at the pellicle. The increased thermal temperature could be lowered by the coating layer with high emissivity material. We analyzed the thermal temperature of the EUV pellicle by finite element method and compared with experimental Ru coating data. Thermal stress of the multi-stack pellicle is also calculated and the stress follows the peak thermal temperature change with coating layer thickness. (C) 2017 Elsevier B.V. All rights reserved.
URI
https://www.sciencedirect.com/science/article/pii/S0167931717300734http://repository.hanyang.ac.kr/handle/20.500.11754/71724
ISSN
0167-9317; 1873-5568
DOI
10.1016/j.mee.2017.02.017
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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