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Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle

Title
Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle
Author
오혜근
Keywords
extreme ultraviolet optical proximity correction; extreme ultraviolet pellicle; throughput
Issue Date
2016-03
Publisher
SPIE
Citation
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, v. 15, No. 2, Page. 1-9
Abstract
The absorption of extreme ultraviolet (EUV) light by the mask-protecting pellicle could be the most critical problem preventing widespread EUV adoption because EUV source power is still too limited to facilitate its use in mass production. We found that transmission loss due to the EUV pellicle could be compensated through the use of proper optical proximity correction (OPC) applied to the mask-pellicle system. Patterning results of optical proximity correction corrected masks with different transmission pellicles are shown for various one-dimensional and two-dimensional patterns. From the results, it is clearly shown that we do not need to increase the dose to avoid the throughput loss, even when using a pellicle with 80% one-pass transmission. The OPC process described in this paper can speed EUV adoption by allowing the use of much thicker films with higher absorption. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
URI
https://www.spiedigitallibrary.org/journals/Journal-of-MicroNanolithography-MEMS-and-MOEMS/volume-15/issue-2/023506/Throughput-compensation-through-optical-proximity-correction-for-realization-of-an/10.1117/1.JMM.15.2.023506.full?SSO=1http://hdl.handle.net/20.500.11754/65532
ISSN
1932-5150
DOI
10.1117/1.JMM.15.2.023506
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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