2001-12 | Parameter extraction for 193 nm chemically amplified resist from refractive index change | 오혜근 |
2018-10 | Pattern Degradation with Larger Particles on EUV Pellicle | 오혜근 |
2015-04 | Patterning dependence on the mask defect for extreme ultraviolet lithography | 오혜근 |
2008-11 | Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process | 오혜근 |
2004-08 | Photoinduced patterning of gold thin film | 오혜근 |
2007-09 | Photoresist Adhesion Effect of Resist Reflow Process | 오혜근 |
2007-02 | Photoresist adhesion effect of resist reflow process | 오혜근 |
2018-10 | A possible wafer heating during EUV exposure | 오혜근 |
2001-03 | Post Exposure Delay Consideration in 193 nm Chemically Amplified Resist | 오혜근 |
2003-02 | A practical extracting method of PEB parameters by using rotating compensator spectroscopic ellipsometer | 오혜근 |
2003-02 | A Practical Method of Extracting the Photoresist Exposure Parameters by Using A Dose-To-Clear Swing Curve | 오혜근 |
2003-02 | Prediction of the Critical Dimensions by Using a Threshold Energy Resist Model | 오혜근 |
2007-10 | Process Extension Techniques for Optical Lithography: Thermal Treatment, Polarization and Double Patterning | 오혜근 |
2007-04 | The process latitude dependency on local photomask haze defect in 70 nm binary intensity mask | 오혜근 |
2002-11 | Process Proximity correction by using neural networks | 오혜근 |
2002-11 | Process proximity correction by using neural networks | 오혜근 |
2002-12 | Process Study of a 200 nm Laser Pattern Generator | 오혜근 |
2001-12 | Real-Time Spectroscopic Ellipsometric Studies of photo-Assisted Chemical Processes | 오혜근 |
2005-05 | Reduction in the Mask Error Factor by Optimizing the Diffraction Order of a Scattering Bar in Lithography | 오혜근 |
2005-04 | Reduction of the Absorber Shadow Effect by Changing the Absorber Side Wall Angle in Extreme Ultraviolet Lithography | 오혜근 |
2006-02 | Reflow modeling for elongated contact hole shape | 오혜근 |
2018-06 | Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents | 오혜근 |
2002-03 | Resist Develop Prediction by Monte Carlo Simulation | 오혜근 |
2002-12 | Resist distribution effect of spin coating | 오혜근 |
2002-03 | Resist Distribution Effect of Spin Coating | 오혜근 |
2003-02 | Resist Pattern Collapse Modeling for Smaller Features | 오혜근 |
2002-11 | Resist pattern collapse with top rounding resist profile | 오혜근 |
2003-06 | Resist Pattern Collapse with Top Rounding Resist Profile | 오혜근 |
2007-04 | Resist Reflow Modeling Including Surface Tension and Bulk Effect | 오혜근 |
2008-02 | Resist reflow process for arbitrary 32 nm node pattern | 오혜근 |