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Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents

Title
Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents
Author
오혜근
Keywords
EUV mask; Hydrocarbon contaminant; Cleaning; Ruthenium surface; Megasonic cleaning
Issue Date
2018-06
Publisher
ELSEVIER SCIENCE BV
Citation
COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS, v. 555, Page. 72-79
Abstract
Under extreme ultraviolet (EUV) exposure, the surfaces of EUV mask and optics are exposed to hydrocarbon contaminant, which reduces the imaging performance and lifetime of EUV mask. Thus, an efficient method is required to remove hydrocarbon contaminant from the mask surface. In this work, a mixture of alkaline chemicals and organic solvents has been proposed for the removal of EUV exposed hydrocarbon contaminant from Ru (Ruthenium) capping layer of EUV mask. A hydrocarbon film with similar properties to EUV hydrocarbon contaminant was prepared by PECVD (plasma enhanced chemical vapor deposition). The hydrocarbon removal efficiency was evaluated by using four kinds of quaternary ammonium hydroxides as alkaline chemicals, and DMSO (dimethyl sulfoxide) and THE (tetrahydrofuran) as polar aprotic organic solvents. Among the alkaline chemicals, tetrabutyl ammonium hydroxide, together with an organic solvent, produced effective removal of hydrocarbon from Ru. Removal of hydrocarbon film using a higher polar organic DMSO solvent required a higher concentration and longer time than THF. The combination of megasonic power and cleaning chemistry enhanced the hydrocarbon removal efficiency significantly.
URI
https://www.sciencedirect.com/science/article/pii/S092777571830582Xhttp://repository.hanyang.ac.kr/handle/20.500.11754/81106
ISSN
0927-7757
DOI
10.1016/j.colsurfa.2018.06.067
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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