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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 1-8 of 8 (Search time: 0.004 seconds).
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Issue Date
Title
Author(s)
2006-02
Numerical modeling of absorber characteristics for EUVL
오혜근
2005-07
Numerical investigation of defect printability in extreme ultraviolet (EUV) reflector: Ru/Mo/Si multilayer system
오혜근
2017-06
Influence of a non-ideal sidewall angle of extreme ultra-violet mask absorber for 1×-nm patterning in isomorphic and anamorphic lithography
오혜근
2008-02
The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(
오혜근
2008-06
Aerial Image Characteristics of a Modified Absorber Model for Extreme Ultraviolet Lithography (EUVL)
오혜근
2016-03
Feasibility of a new absorber material for high NA extreme ultraviolet lithography
오혜근
2007-01
Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)
오혜근
2016-05
The impact of the residual stress on the EUV pellicle
오혜근
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-Author
8
오혜근
-Subject
1
EUV mask
1
High NA
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high NA
1
Horizontal-vertical CD bias
1
illumination angle
1
mechanical
1
oxidation
1
Pattern printability
1
pellicle
1
phase defect
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2010 - 2017
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2005 - 2009
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