Aerial Image Characteristics of a Modified Absorber Model for Extreme Ultraviolet Lithography (EUVL)

Title
Aerial Image Characteristics of a Modified Absorber Model for Extreme Ultraviolet Lithography (EUVL)
Author
오혜근
Keywords
EUVL; aerial image characteristics; shadowing effect; sidewall angle; illumination angle
Issue Date
2008-06
Publisher
KOREAN PHYSICAL SOC
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 52, No. 6, Page. 1759-1762
Abstract
The aerial image characteristics of the modified absorber model with various sidewall angles were quantitatively investigated by calculating the near field intensity on a mask and the aerial image intensity on a wafer. For the calculation of the near field intensity and the aerial image intensity of a 25-nm isolated patterned mask, SOLID-EUV, which is capable of a rigorous electromagnetic-field computation, was employed. The aerial image intensity of a patterned mask with positive and negative sidewall angles was calculated and compared with the value of the vertical sidewall model for various sidewall angle and illumination angle variations. Through the investigation of the aerial image characteristics of various absorber models, the absorber model with a positive sidewall angle can be suggested as the optimal absorber design to minimize the shadowing effect.
URI
http://www.jkps.or.kr/journal/view.html?volume=52&number=6&spage=1759&year=2008http://repository.hanyang.ac.kr/handle/20.500.11754/80440
ISSN
0374-4884
DOI
10.3938/jkps.52.1759
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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