Browsing byAuthor오혜근

Jump to:
All A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
  • Sort by:
  • In order:
  • Results/Page
  • Authors/Record:

Showing results 151 to 173 of 173

Issue DateTitleAuthor(s)
2016-03Stress-induced pellicle analysis for extreme-ultraviolet lithography오혜근
2008-02The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(오혜근
2004-11A study of process parameter control for nanopattern오혜근
2007-01Theoretical investigation of pattern printability of oxidized Si and Ru capping models for extreme ultraviolet lithography (EUVL)오혜근
2017-02Thermal analysis of extreme ultraviolet pellicle with metallic coatings오혜근
2017-12thermo-optical optimization of extreme-ultraviolet pellicles for future generations오혜근
2021-02Thermomechanical stability evaluation of various pellicle structures with contaminant particles오혜근
2001-07Thickness Reduction Effect in a Chemically amplified Resist Simulator오혜근
2001-07Thickness Reduction Effect in Chemically Amplified Resist Simulator오혜근
2002-11Threshold Energy Resist Model for CD Prediction오혜근
2003-06Threshold energy resist model for critical dimension prediction오혜근
2016-06Throughput compensation through optical proximity correction for realization of an extreme ultraviolet pellicle오혜근
2016-03Throughput compensation through optical proximity correction for realization of an extreme-ultraviolet pellicle오혜근
2003-02Use of Rotating Compensator Spectroscopic Ellipsometry for Monitoring the Photoresist Etching on Si Wafer오혜근
2007-09Which Mask is Preferred for Sub-60 nm Node Imaging?오혜근
2000-02감광제 고유의 ABC 노광변수 추출 시뮬레이터오혜근
2003-12거친 표면을 가진 흡수체와 버퍼의 측면에 의한 극자외선 산란효과오혜근
2004-12극자외선 리소그래피에서 마스크 결함에 의한 이미지 특징오혜근
2002-01기판 단차에 따른 감광제의 분포와 선폭 변화오혜근
2003-12복합적인 레지스트 패턴 붕괴현상의 역학적 해석오혜근
2002-09신경망을 이용한 공정 오차 보정오혜근
2002-09패턴 Top Rounding 효과를 고려한 패턴 붕괴 전산모사오혜근
2002-01화학 증폭형 감광제의 전산모사를 위한 PEB 변수 추출오혜근

BROWSE