| 2004-11 | Bulk effects of the thermal flow resists | 오혜근 |
| 2005-06 | Bulk effects of thermal flow resists | 오혜근 |
| 2002-10 | Bulk Image Formation of Scalar Modeling in a Photoresist | 오혜근 |
| 2005-06 | Calibration-Free Multichannel Ellipsometry for Retardance Measurement | 오혜근 |
| 2017-03 | CD Error Caused by Aberration and Its Possible Compensation by Optical Proximity Correction in Extreme-Ultraviolet Lithography | 오혜근 |
| 2002-03 | CD Prediction by Threshold Energy Resist Model | 오혜근 |
| 2007-02 | Characteristics and prevention of pattern collapse in EUV lithography | 오혜근 |
| 1999-12 | Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay | 오혜근 |
| 1999-12 | Characteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delayCharacteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delayCharacteristics of 193 nm chemically amplified resist during post exposure bake and post exposure delay | 오혜근 |
| 2006-11 | Chromeless phase lithography using scattering bars and zebra patterns | 오혜근 |
| 2005-03 | Contact hole reflow by finite element method | 오혜근 |
| 2008-02 | Critical dimension control for 32 nm node random contact hole array using resist reflow process | 오혜근 |
| 2007-09 | Critical dimension control for 32 nm random contact hole array with resist reflow process | 오혜근 |
| 2017-09 | Critical dimension variation caused by wrinkle in extreme ultra-violet pellicle for 3-nm node | 오혜근 |
| 2005-11 | Defect characterization of Ru/Mo/Si EUV reflector by optical modeling | 오혜근 |
| 2005-07 | Determination of the optical functions of various liquids by rotating compensator multichannel spectroscopic ellipsometry | 오혜근 |
| 2007-08 | Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer | 오혜근 |
| 2002-06 | Development of multichannel ellipsometry with synchronously rotating polarizer and analyzer | 오혜근 |
| 2016-04 | Eco-friendly photolithography using water-developable pure silk fibroin | 오혜근 |
| 2004-06 | Effect of Extreme Ultraviolet Light Scattering from the Rough Absorber and Buffer Side Wall | 오혜근 |
