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CD Prediction by Threshold Energy Resist Model

Title
CD Prediction by Threshold Energy Resist Model
Author
오혜근
Issue Date
2002-03
Publisher
SPIE-INT SOCIETY OPTICAL ENGINEERING
Citation
Proceedings of the SPIE, v. 4691, page. 1287-1295
Abstract
In the step of developing lithography devices, VTRM (Variable Threshold Resist Model), aerial image based simulation, is useful to get feedback for a resist process margin. VTRM is also used to compensate for the mask pattern&apos
URI
https://www.spiedigitallibrary.org/conference-proceedings-of-spie/4691/0000/CD-prediction-by-threshold-energy-resist-model-TERM/10.1117/12.474510.short?SSO=1&tab=ArticleLinkhttps://repository.hanyang.ac.kr/handle/20.500.11754/156753
ISSN
0277-786X
DOI
10.1117/12.474510
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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