Eco-friendly photolithography using water-developable pure silk fibroin

Title
Eco-friendly photolithography using water-developable pure silk fibroin
Author
오혜근
Keywords
ELECTRON-BEAM LITHOGRAPHY; FABRICATION; RESISTS; ROUTE; FILMS
Issue Date
2016-04
Publisher
ROYAL SOC CHEMISTRY
Citation
RSC ADVANCES, v. 6, No. 45, Page. 39330-39334
Abstract
We report that pure silk fibroin can be a green and biofunctional photoresist for deep ultraviolet photolithography. All processes are entirely water-based, from resist solvent to resist removal, and rely on the phototendering effect that decreases the crystallinity of silk fibroin films by DUV exposure. Additionally, the potential decrease in activity of bio-dopants due to high-energy irradiation is irrelevant to our positive-tone lithographic method.
URI
http://pubs.rsc.org/-/content/articlehtml/2016/ra/c6ra04516bhttp://hdl.handle.net/20.500.11754/52606
ISSN
2046-2069
DOI
10.1039/c6ra04516b
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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