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Showing results 33 to 62 of 103

Issue DateTitleAuthor(s)
2011-12Fabrication of 2D photonic crystal assisted Y2O3:Eu3+ thin-film phosphors by direct nano-imprinting안진호
2016-09Fabrication of Fe3O4-ZnO core-shell nanoparticles by rotational atomic layer deposition and their multi-functional properties안진호
2019-10Fabrication of free-standing nanoscale SiNx membranes with enhanced burst pressure via improved etching process안진호
2011-01Fabrication of trench nanostructures for extreme ultraviolet lithography masks by atomic force microscope lithography안진호
2014-03FDTD simulation of transmittance characteristics of one-dimensional conducting electrodes안진호
2019-07Fe3O4-ZnO Core-Shell Nanoparticles Fabricated by Ultra-Thin Atomic Layer Deposition Technique as a Drug Delivery Vehicle안진호
2016-07GeOx interfacial layer scavenging remotely induced by metal electrode in metal/HfO2/GeOx/Ge capacitors안진호
2015-09HF 습식 식각을 이용한 극자외선 노광 기술용 SiNx 펠리클 제작 공정안진호
2020-08High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor안진호
2022-03High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane안진호
2022-01Highly Reliable Selection Behavior with Controlled Ag Doping of Nano-polycrystalline ZnO Layer for 3D X-Point Framework안진호
2014-04Highly sensitive wide bandwidth photodetectors using chemical vapor deposited graphene안진호
2016-07Impact of EUV Pellicle Transmittance on Imaging Performance Analyzed by Coherent Scattering Microscopy안진호
2012-01Impact of ozone concentration on atomic layer deposited HfO2 on GaAs안진호
2015-03Impact of the non-uniform intensity distribution caused by a meshed pellicle of extreme ultraviolet lithography안진호
2022-01Impact of thermal expansion coefficient on the local tilt angle of extreme ultraviolet pellicle안진호
2011-03Improved electrical properties of Pt/HfO2/Ge using in situ water vapor treatment and atomic layer deposition안진호
2016-07Improved Margin of Absorber Pattern Sidewall Angle Using Phase Shifting Extreme Ultraviolet Mask안진호
2018-03Improved resistive switching characteristics of a Pt/HfO2/Pt resistor by controlling anode interface with forming and switching polarity안진호
2016-04Influence of Annealing Temperature on Structural and Optical Properties of Undoped and Al-Doped Nano-ZnO Films Prepared by Sol–Gel Method안진호
2019-04Interface-Driven Phase Transition of Phase-Change Material안진호
2022-04Investigation of the Resistivity and Emissivity of a Pellicle Membrane for EUV Lithography안진호
2015-07Lattice Distortion in In3SbTe2 Phase Change Material with Substitutional Bi안진호
2015-08Lattice Distortion in In3SbTe2 Phase Change Material with Substitutional Bi (vol 5, 12867, 2015)안진호
2020-07Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source안진호
2018-01Mask Materials and Designs for Extreme Ultra Violet Lithography안진호
2019-09Material design for Ge2Sb2Te5 phase-change material with thermal stability and lattice distortion안진호
2015-04Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography안진호
2020-03Memory Operations of Zero Impact Ionization, Zero Subthreshold Swing FET Matrix Without Selectors안진호
2014-12Metal-HfO2-Ge capacitor: Its enhanced charge trapping properties with S-treated substrate and atomic-layer-deposited HfO2 layer안진호

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