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Impact of EUV Pellicle Transmittance on Imaging Performance Analyzed by Coherent Scattering Microscopy

Title
Impact of EUV Pellicle Transmittance on Imaging Performance Analyzed by Coherent Scattering Microscopy
Author
안진호
Keywords
EUV; Pellicle; Imaging Performance; Coherent Scattering Microscopy
Issue Date
2016-07
Publisher
AMER SCIENTIFIC PUBLISHERS
Citation
NANOSCIENCE AND NANOTECHNOLOGY LETTERS, v. 8, NO. 7, Page. 615-619
Abstract
We investigated the impact of the transmittance of EUV pellicles on imaging performance using coherent scattering microscopy (CSM). Although the pellicle has no effect on the optical path of diffracted light, it deteriorates the imaging performance owing to EUV photon loss. The results showed that the line critical dimension (CD) increased by 20.7% and that the normalized image log slope (NILS) decreased by 7.4% upon using a pellicle with 80% transmittance. Since the local transmittance variation due to pellicle non-uniformity or contamination can cause local CD variation, it is important to ensure uniform transmittance throughout the active pellicle area.
URI
http://www.ingentaconnect.com/content/asp/nnl/2016/00000008/00000007/art00016;jsessionid=4pcgspnpbc7s0.x-ic-live-03https://repository.hanyang.ac.kr/handle/20.500.11754/74438
ISSN
1941-4900; 1941-4919
DOI
10.1166/nnl.2016.2226
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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