Hanyang University repository
menu
검색
Library
Hanyang
Browse
Communities & Collections
Titles
Authors
My Repository
My Account
Receive email updates
Edit Profile
Repository at Hanyang University
Search
All of Repository
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
Articles
Start a new search
Current filters:
Title
Author
Subject
Date Issued
Equals
Contains
ID
Not Equals
Not Contains
Not ID
Add filters:
Title
Author
Subject
Date Issued
Equals
Contains
ID
Not Equals
Not Contains
Not ID
Results/Page
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
Sort items by
Relevance
Title
Issue Date
In order
Ascending
Descending
Authors/record
All
1
5
10
15
20
25
30
35
40
45
50
Results 31-40 of 68 (Search time: 0.003 seconds).
Item hits:
Issue Date
Title
Author(s)
2008-02
Slab thickness and magnetic field effects on dust ion- acoustic surface waves on a thin magnetized dusty plasma slab
김옥경
2008-02
Critical dimension control for 32 nm node random contact hole array using resist reflow process
오혜근
2008-02
Critical dimension control for 32 nm node random contact hole array using resist reflow process
홍주유
2008-06
Adaptive Wavelet Packet Transformation에서 다양한 Filter를 이용한 Speech Enhancement의 비교에 관한 연구
권영헌
2008-06
Anisotropic resist reflow process simulation for 22 nm elongated contact holes
오혜근
2008-06
Defect-induced degradation of rectification properties of aged Pt/n-InxZn1-xOy Schottky diodes
강보수
2008-06
Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes
홍주유
2008-06
Aerial Image Characteristics of a Modified Absorber Model for Extreme Ultraviolet Lithography (EUVL)
오혜근
2008-01
Comparative structural and electrical analysis of NiO and Ti doped NiO as materials for resistance random access memory
강보수
2008-01
32 nm 1:1 Line and Space Patterning by Resist Reflow Process
오혜근
previous
1
2
3
4
5
6
7
next
Discover
-Author
23
오혜근
21
정영대
11
정희준
8
강보수
2
권영헌
2
홍주유
1
김옥경
-Subject
6
32 nm line and space half-pitch
6
lithography
6
Navier-Stokes equation
5
Resist reflow process
5
resist reflow process
4
optical proximity correction
3
haze
3
pellicle
2
22 nm node
2
22 nm pattern
next >
BROWSE
Communities & Collections
Titles
Authors