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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 21-30 of 77 (Search time: 0.002 seconds).
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Issue Date
Title
Author(s)
2005-06
ArF photoresist parameter optimization for mask error enhancement factor reduction
오혜근
2005-05
The evaluation of aberration effects according to pattern shape and duty ratio
오혜근
2005-03
Contact hole reflow by finite element method
오혜근
2005-05
Simulation of thermal resist flow process
오혜근
2005-03
Line width variation with absorber thickness in extreme ultraviolet lithography
오혜근
2006-07
Simulation of rectangular isolated pattern images by applying phase shift masks in high-exposure gaps to protect LCD photo masks
오혜근
2006-07
Evaluation of partial coherent imaging using the modulation transfer function in immersion lithography
오혜근
2006-08
Modeling for Resist Reflow of an Elongated Contact Hole
오혜근
2006-08
The influence of transmission reduction by mask haze formation in ArF lithography
오혜근
2005-12
Rigorous coupled-wave analysis를 이용한 극자외선 리소그래피에서 그림자 효과를 줄이기 위한 마스크 변형
오혜근
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lithography
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Lithography
6
Resist reflow process
5
EUVL
5
Navier-Stokes equation
4
Contact hole
4
ellipsometry
4
Lithography simulation
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32 nm line and space half-pitch
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32 nm node
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-Date issued
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2009
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