High-Resolution Multicolor Patterning of InP Quantum Dot Films by Atomic Layer Deposition of ZnO
- Title
- High-Resolution Multicolor Patterning of InP Quantum Dot Films by Atomic Layer Deposition of ZnO
- Author
- 조성용
- Keywords
- InP quantum dots; patterning, photolithography; atomic layer deposition; thick QD patterning; photoacid generator
- Issue Date
- 2023-06-22
- Publisher
- AMER CHEMICAL SOC
- Citation
- ACS PHOTONICS, v. 10, NO 8, Page. 2598-2607
- Abstract
- This paper presents the high-resolution(˃2000 PPI) multicolorpatterning of InP quantum dot films using a conventional photolithographyprocess with a positive photoresist (PR). The solvent resistance ofthe quantum dot (QD) film is achieved by depositing an ultrathin ZnOlayer through atomic layer deposition. This is different from previousstudies, which lack high-resolution patterning or compatibility withindium phosphide (InP) QDs owing to chemical weaknesses. By employinga positive PR with a photoacid generator, the side-by-side patterningprocess yields multicolor patterns of red- and green-colored InP-basedQDs. Additionally, the stacking of each color QD film is achieved.The patterning process can be used to fabricate QD light-emittingdiode devices without degrading their performance. This process canbe used not only for thin (˂100 nm) QD films, which are used inQD-LED devices, but also for thick (˃1 & mu;m) QD films, whichcanbe used in the color-conversion layer with a backlight.
- URI
- https://information.hanyang.ac.kr/#/eds/detail?an=170014089&dbId=edohttps://repository.hanyang.ac.kr/handle/20.500.11754/190233
- ISSN
- 2330-4022
- DOI
- 10.1021/acsphotonics.3c00332
- Appears in Collections:
- COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > PHOTONICS AND NANOELECTRONICS(나노광전자학과) > Articles
- Files in This Item:
- 2023.6_조성용_High-Resolution Multicolor Patterning of InP Quantum Dot Films by Atomic Layer Deposition of ZnO.pdfDownload
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