143 0

Fast electroless fabrication of uniform mesoporous silicon layers

Title
Fast electroless fabrication of uniform mesoporous silicon layers
Author
이정호
Keywords
Metal assisted chemical etching; Pt nanoparticle; Mesoporous Si
Issue Date
2013-04
Publisher
Pergamon Press Ltd.
Citation
Electrochimica Acta, v. 94, Page. 57-61
Abstract
We present a new route for the fabrication of mesoporous silicon using Pt nanoparticle-assisted chemical etching. In contrast to stain etching, the mesoporous silicon films show good uniformity. The porosity and thickness can be tuned well via adjusting the HF and H2O2 concentration. Etching rates of more than 1.7 mu m/min have been obtained under optimized conditions. The charge transfer through the Pt Si nano-Schottky contact was simulated to qualitatively explain the observed phenomenon. Our approach will allow a much simpler and cheaper route to fabricate mesoporous silicon layers compared to electrochemical etching as used in the area of surface micromachining and layer transfer techniques. (C) 2013 Elsevier Ltd. All rights reserved.
URI
https://www.sciencedirect.com/science/article/pii/S0013468613001837?via%3Dihubhttps://repository.hanyang.ac.kr/handle/20.500.11754/181368
ISSN
0013-4686;1873-3859
DOI
10.1016/j.electacta.2013.01.136
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
Files in This Item:
There are no files associated with this item.
Export
RIS (EndNote)
XLS (Excel)
XML


qrcode

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.

BROWSE