Repository at Hanyang UniversityCOLLEGE OF ENGINEERING SCIENCES[E](공학대학)MECHANICAL ENGINEERING(기계공학과)Articles
224
0
Tailoring polymer microstructure for the mitigation of the pattern collapse in sub-10 nm EUV lithography: Multiscale simulation study
- Title
- Tailoring polymer microstructure for the mitigation of the pattern collapse in sub-10 nm EUV lithography: Multiscale simulation study
- Author
- 최준명
- Issue Date
- 2021-01
- Publisher
- ELSEVIER
- Citation
- APPLIED SURFACE SCIENCE, v. 536, Article no. 147514, 14pp
- Abstract
- Photoresist (PR) nanopatterning using extreme-ultraviolet-lithography (EUVL) drives significant advances in integrated-circuit downsizing
- URI
- https://www.sciencedirect.com/science/article/pii/S0169433220322716https://repository.hanyang.ac.kr/handle/20.500.11754/167038
- ISSN
- 0169-4332
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MECHANICAL ENGINEERING(기계공학과) > Articles
- Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.
