Repository at Hanyang UniversityCOLLEGE OF ENGINEERING SCIENCES[E](공학대학)MECHANICAL ENGINEERING(기계공학과)Articles
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dc.contributor.author최준명-
dc.date.accessioned2021-12-23T04:25:55Z-
dc.date.available2021-12-23T04:25:55Z-
dc.date.issued2021-01-
dc.identifier.citationAPPLIED SURFACE SCIENCE, v. 536, Article no. 147514, 14ppen_US
dc.identifier.issn0169-4332-
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0169433220322716-
dc.identifier.urihttps://repository.hanyang.ac.kr/handle/20.500.11754/167038-
dc.description.abstractPhotoresist (PR) nanopatterning using extreme-ultraviolet-lithography (EUVL) drives significant advances in integrated-circuit downsizingen_US
dc.language.isoen_USen_US
dc.publisherELSEVIERen_US
dc.titleTailoring polymer microstructure for the mitigation of the pattern collapse in sub-10 nm EUV lithography: Multiscale simulation studyen_US
dc.typeArticleen_US
dc.relation.volume536-
dc.identifier.doi10.1016/j.apsusc.2020.147514-
dc.relation.page1-14-
dc.relation.journalAPPLIED SURFACE SCIENCE-
dc.contributor.googleauthorKim, Muyoung-
dc.contributor.googleauthorPark, Sungwoo-
dc.contributor.googleauthorMoon, Junghwan-
dc.contributor.googleauthorCho, Maenghyo-
dc.contributor.googleauthorChoi, Joonmyung-
dc.relation.code2021006870-
dc.sector.campusE-
dc.sector.daehakCOLLEGE OF ENGINEERING SCIENCES[E]-
dc.sector.departmentDEPARTMENT OF MECHANICAL ENGINEERING-
dc.identifier.pidjoonchoi-
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