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Tailoring polymer microstructure for the mitigation of the pattern collapse in sub-10 nm EUV lithography: Multiscale simulation study

Title
Tailoring polymer microstructure for the mitigation of the pattern collapse in sub-10 nm EUV lithography: Multiscale simulation study
Author
최준명
Issue Date
2021-01
Publisher
ELSEVIER
Citation
APPLIED SURFACE SCIENCE, v. 536, Article no. 147514, 14pp
Abstract
Photoresist (PR) nanopatterning using extreme-ultraviolet-lithography (EUVL) drives significant advances in integrated-circuit downsizing
URI
https://www.sciencedirect.com/science/article/pii/S0169433220322716https://repository.hanyang.ac.kr/handle/20.500.11754/167038
ISSN
0169-4332
DOI
10.1016/j.apsusc.2020.147514
Appears in Collections:
COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MECHANICAL ENGINEERING(기계공학과) > Articles
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