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Mechanism of low temperature hydrogen-annealing-induced degradation in Pb(Zr0.4Ti0.6)O3 capacitors

Title
Mechanism of low temperature hydrogen-annealing-induced degradation in Pb(Zr0.4Ti0.6)O3 capacitors
Author
강보수
Issue Date
2002-07
Publisher
AMER INST PHYSICS
Citation
APPLIED PHYSICS LETTERS, v. 81, issue. 4, page. 697-699
Abstract
Changes in the polarization-field hysteresis loop were systematically investigated for Pb(Zr0.4Ti0.6)O-3 capacitors after forming gas annealing at 200 degreesC. Voltage shift in hysteresis was strongly dependent on the polarization states and ascribed to an asymmetric distribution of defect charges and pinned defect dipoles. Field recovery of the imprinted capacitors and increase in coercive field after the recovery were discussed in conjunction with reversible defect dipoles. From the relaxation of the voltage shift with an activation energy of 0.21 eV, it is inferred that charge trapping may be the main cause of the voltage shift and the subsequent degradation of the capacitors by pinning the polarization and defect dipoles. (C) 2002 American Institute of Physics.
URI
https://aip.scitation.org/doi/10.1063/1.1492006https://repository.hanyang.ac.kr/handle/20.500.11754/157542
ISSN
0003-6951
DOI
10.1063/1.1492006
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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