SiO; cobalt; ellipsometry; effective medium theory
Issue Date
2003-03
Publisher
INST PURE APPLIED PHYSICS
Citation
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, v.42, Issue.3, Page.1416-1417
Abstract
Spectroscopic ellipsometry (SE) and X-ray photoelectron spectroscopy (XPS) were employed to study the composite thin films of SiO and cobalt (Co) prepared by sputtering technique. The optical properties of these films could be expressed as mixtures of SiO and Co using effective medium approximation (EMA) by Bruggeman. When the compositional properties of films analyzed by EMA and XPS were compared, the optical volume of SiO was found to be 5.47 times greater than that of Co.