극자외선 리소그래피에서 마스크 결함에 의한 이미지 특징
- Title
- 극자외선 리소그래피에서 마스크 결함에 의한 이미지 특징
- Other Titles
- Aerial Image Characterization for Defects in an Extreme-Ultraviolet Mask
- Author
- 김옥경
- Issue Date
- 2004-12
- Publisher
- 한양대학교 이학기술연구소
- Citation
- 이학기술연구지, v.7, Page.65-72
- Abstract
- Simulation has been used to predict aerial images for masks with defect-free multilayer and with defect in multilayer. Mask defects are easily produced in an extreme-ultraviolet lithography mask fabrication process, because 80 Mo/si multilayer films are stacked and each stack is made from 2 to 4㎚. In this case, the multilayer can be stacked with defects and with slightly different heights. It is difficult to achieve an aerial image which is desired. This paper discusses various image properties when there is no defect and when there are different kinds of defects in the multilayer. The results are calculated by using SOLE-EUV of Simga-C. A finite-difference time-domain algorithm is used, and the aerial images caused by defects in the multilayer are also characterized.
- URI
- https://www.earticle.net/Article/A106194https://repository.hanyang.ac.kr/handle/20.500.11754/154213
- ISSN
- 2005-9051
- Appears in Collections:
- COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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