염소를 포함한 액체에서의 금박막 패터닝과 표면 분석

Abstract

Various metals or their alloys are used in the semiconductor metallization process or in micro-or nano-structure devices. We report a novel etching technique of gold film based on new phenomenon that gold is soluble in chlorine containing solutions or solvents under UV irradiation. Mask patterns can be transferred to gold surface directly without resorting to complicate photoresist process. And, etch rate could be controlled from sub nanometer to few tens of nanometers per minute by adjusting exposure parameters. Moreover, non-toxic liquid such as NaCl solution can be used for the process. AFM(atomic force microscope), optical microscope, ellipsometry were used to characterize the etch rate and the surface morphology.