Preparation of TiO2 thin film by liquid sprayed mist CVD method
- Title
- Preparation of TiO2 thin film by liquid sprayed mist CVD method
- Author
- 좌용호
- Keywords
- Synthesis of TiO2 thin film; Ultrasonic atomizer; Liquid sprayed mist CVD; 1 atmosphere
- Issue Date
- 2004-03
- Publisher
- Elsevier B.V.
- Citation
- MATERIALS SCIENCE AND ENGINEERING: B, v. 107, No. 3, Page. 289-294
- Abstract
- Titanium dioxide (TiO2) thin film was synthesized on α-Al2O3 (0 0 0 1) substrate by liquid sprayed mist chemical vapor deposition under 1 atm. Tetraethylorthotitanate [TEOT, (C2H5O)4Ti] was used as starting material. The liquid source to synthesize TiO2 thin film was prepared from dissolving the starting materials in 2-methoxyethanol. The TiO2 thin film was obtained as the amorphous phase at 300 °C and crystalline anatase type TiO2 above 400 °C. The crystal of thin film was mainly oriented to (1 1 2) plane. The degree of (1 1 2) orientation, the thickness, and the surface roughness of the film were strongly dependent on the substrate temperature and deposition time. By the controlling the substrate temperature and deposition time, TiO2/α-Al2O3 (0 0 0 1) films with preferred orientation were successfully fabricated, and the film deposition rate was about 10 nm/min.
- URI
- https://www.sciencedirect.com/science/article/pii/S0921510704000030?via%3Dihub#!https://repository.hanyang.ac.kr/handle/20.500.11754/134692
- ISSN
- 0921-5107
- DOI
- 10.1016/j.mseb.2003.12.010
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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