Impact of an interfacial layer on the electrical performance of p-channel tin monoxide field-effect transistors
- Title
- Impact of an interfacial layer on the electrical performance of p-channel tin monoxide field-effect transistors
- Author
- 정재경
- Keywords
- field-effect transistors; p-type semiconductors; SiOF; SnO
- Issue Date
- 2017-10
- Publisher
- WILEY-V C H VERLAG GMBH
- Citation
- PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, v. 11, no. 10, Article no. 1700213
- Abstract
- This study examined the insertion effect of an interfacial, 7-nm-thick SiNx and SiOF layer on the performance of p-channel tin monoxide (SnO) fieldeffect transistors (FETs). The control SnO FETs, which had a thermal SiO2 gate dielectric, exhibited a mobility, gate swing, threshold voltage (V-TH) and I-ON/OFF ratio of 2.8 cm(2) V(-1)s(-1), 6.9 V decade(-1), 19.0 V, and 1.8 x 10(3), respectively. The SiNx-inserted SnO FETs showed a loss in drain current modulation due to the creation of interfacial trap states. In contrast, the gate swing and VTH values were improved substantially to 5.4 V decade(-1) and 2.0 V for the SiOF-inserted SnO FETs, respectively, whereas the comparable mobility and ION/OFF ratio were preserved. The rationale of the improvement is discussed with respect to Fermi-energy pinning based on the valence band spectra.
- URI
- https://onlinelibrary.wiley.com/doi/abs/10.1002/pssr.201700213https://repository.hanyang.ac.kr/handle/20.500.11754/116024
- ISSN
- 1862-6254; 1862-6270
- DOI
- 10.1002/pssr.201700213
- Appears in Collections:
- COLLEGE OF ENGINEERING[S](공과대학) > ELECTRONIC ENGINEERING(융합전자공학부) > Articles
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