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Characterization of Free-Standing Nano-Membranes by Using Ellipsometry

Title
Characterization of Free-Standing Nano-Membranes by Using Ellipsometry
Author
안일신
Keywords
Extreme UV; Lithography; Pellicle; Membrane; Ellipsometry; PELLICLE
Issue Date
2018-04
Publisher
KOREAN PHYSICAL SOC
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 72, No. 8, Page. 868-872
Abstract
The thickness of the pellicle is only a few tens of microns in extreme ultraviolet lithography (EUVL). This is because the absorption loss by the pellicle is high. Thus, the thickness and contamination on the surface of the EUVL pellicle are important factors for controlling the transmission of EUV light. In this work, we fabricate ultra-thin silicon-nitride membranes for EUVL pellicles and use micro-spot spectroscopic ellipsometry and imaging ellipsometry for characterization. We successfully deduce not only the thickness but also the optical function of the membrane. However, we found that some precautions were required for accurate measurement of the free-standing thin membranes by using ellipsometry. Issues related to the vibration of the membrane and the sensitivity of the measurement are discussed.
URI
https://link.springer.com/article/10.3938/jkps.72.868http://repository.hanyang.ac.kr/handle/20.500.11754/81019
ISSN
0374-4884
DOI
10.3938/jkps.72.868
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > PHOTONICS AND NANOELECTRONICS(나노광전자학과) > Articles
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