Characterization of Free-Standing Nano-Membranes by Using Ellipsometry
- Title
- Characterization of Free-Standing Nano-Membranes by Using Ellipsometry
- Author
- 안일신
- Keywords
- Extreme UV; Lithography; Pellicle; Membrane; Ellipsometry; PELLICLE
- Issue Date
- 2018-04
- Publisher
- KOREAN PHYSICAL SOC
- Citation
- JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 72, No. 8, Page. 868-872
- Abstract
- The thickness of the pellicle is only a few tens of microns in extreme ultraviolet lithography (EUVL). This is because the absorption loss by the pellicle is high. Thus, the thickness and contamination on the surface of the EUVL pellicle are important factors for controlling the transmission of EUV light. In this work, we fabricate ultra-thin silicon-nitride membranes for EUVL pellicles and use micro-spot spectroscopic ellipsometry and imaging ellipsometry for characterization. We successfully deduce not only the thickness but also the optical function of the membrane. However, we found that some precautions were required for accurate measurement of the free-standing thin membranes by using ellipsometry. Issues related to the vibration of the membrane and the sensitivity of the measurement are discussed.
- URI
- https://link.springer.com/article/10.3938/jkps.72.868https://repository.hanyang.ac.kr/handle/20.500.11754/81019
- ISSN
- 0374-4884
- DOI
- 10.3938/jkps.72.868
- Appears in Collections:
- COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > PHOTONICS AND NANOELECTRONICS(나노광전자학과) > Articles
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