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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Results 1-10 of 23 (Search time: 0.002 seconds).
Item hits:
Issue Date
Title
Author(s)
2008-09
Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask
오혜근
2008-11
Heat conduction to photoresist on top of wafer during post exposure bake process: I. Numerical Approach
오혜근
2008-11
A mask generation approach to double patterning technology with inverse lithography
오혜근
2008-05
Application of ellipsometry in immersion lithography
오혜근
2008-11
Influence of Various Defects on Extreme Ultra-Violet Mask
오혜근
2008-11
Acid diffusion length dependency for 32 nm node attenuated and chromeless phase shift mask
오혜근
2008-11
Heat conduction to photoresist on top of wafer during post exposure bake process:II. Application
오혜근
2008-11
Solving the Navier-Stokes Equation for Thermal Reflow
오혜근
2008-11
Haze defects due to pellicle adhesive
오혜근
2008-11
Patterning of 32 nm 1:1 Line and Space by Resist Reflow Process
오혜근
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lithography
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Resist reflow process
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32 nm line and space half-pitch
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Navier-Stokes equation
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22 nm node
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32 nm node
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Double patterning
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EUVL
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haze
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Lithography
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