Influence of Various Defects on Extreme Ultra-Violet Mask

Title
Influence of Various Defects on Extreme Ultra-Violet Mask
Author
오혜근
Keywords
22 nm node; Contrast; Defect; EUV; Lithography
Issue Date
2008-11
Publisher
SPIE
Citation
Proceedings of SPIE - The International Society for Optical Engineering, v. 7140, Article no. 71401N
Abstract
Mask defect is one of the biggest problems in Extreme Ultraviolet Lithography (EUV) technology. EUV mask must be free of small defects, requiring development of new inspection tools and low defect fabrication processes. So, we studied the influences of the defects on the mask for 22 nm line and space pattern. First, we changed the light quality caused by the various wavelength shift, incident angle, and the defect material with different refractive index. Second, we changed the defect size from 20 nm to 16 nm because 18 nm defect is assumed to a critical defect size for 22 nm node. Third, we also changed the defect positions; on top of the absorber, on the valley of the absorber, and at the sides of the absorber. Finally, we simulated the influence for the different shaped defect. A square pillar defect shows very different behavior compared to the more realistic round shaped defect. Defect of higher refractive index gives little influence, while defect of lower refractive index gives larger influence. A more realistic elliptical shaped defect gives less influence compared to square shaped defect. All the defect and EUV parameters will influence to the printability of the defect, but more study is needed to judge whether a certain defect can influence the printed pattern.
URI
https://www.spiedigitallibrary.org/conference-proceedings-of-spie/7140/1/Influences-of-various-defects-on-extreme-ultra-violet-mask/10.1117/12.804570.fullhttp://repository.hanyang.ac.kr/handle/20.500.11754/80774
ISSN
0277-786X
DOI
10.1117/12.804570
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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