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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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2006-02
EUV lithography simulation for the 32 nm node
오혜근
2008-11
Acid diffusion length dependency for 32 nm node attenuated and chromeless phase shift mask
오혜근
2008-02
Resist reflow process for arbitrary 32 nm node pattern
오혜근
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Acid diffusion length
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