Hanyang University repository
menu
검색
Library
Hanyang
Browse
Communities & Collections
Titles
Authors
My Repository
My Account
Receive email updates
Edit Profile
Repository at Hanyang University
Search
All of Repository
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED CHEMISTRY(응용화학과)
APPLIED MATHEMATICS(응용수학과)
APPLIED PHYSICS(응용물리학과)
CHEMICAL AND MOLECULAR ENGINEERING(화학분자공학과)
MARINE SCIENCE AND CONVERGENCE ENGINEERING(해양융합공학과)
MARINE SCIENCES AND CONVERGENT TECHNOLOGY(해양융합과학과)
MOLECULAR AND LIFE SCIENCE(분자생명과학과)
PHOTONICS AND NANOELECTRONICS(나노광전자학과)
ETC
Start a new search
Current filters:
Title
Author
Subject
Date Issued
Equals
Contains
ID
Not Equals
Not Contains
Not ID
Title
Author
Subject
Date Issued
Equals
Contains
ID
Not Equals
Not Contains
Not ID
Add filters:
Title
Author
Subject
Date Issued
Equals
Contains
ID
Not Equals
Not Contains
Not ID
Results/Page
5
10
15
20
25
30
35
40
45
50
55
60
65
70
75
80
85
90
95
100
Sort items by
Relevance
Title
Issue Date
In order
Ascending
Descending
Authors/record
All
1
5
10
15
20
25
30
35
40
45
50
Results 11-20 of 35 (Search time: 0.003 seconds).
Item hits:
Issue Date
Title
Author(s)
2006-11
Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography
안일신
2006-11
Chromeless Phase Lithography Using Scattering Bars and Zebra Patterns
안일신
2006-07
Evaluation of Partial Coherent Imaging Using the Modulation Transfer Function in Immersion Lithography
안일신
2006-09
Picosecond Nonlinear OPtical Transmission Measurement on Anatase TiO2 THin Films
안일신
2006-08
The Influence of Transmission Reduction by Mask Haze Formation in ArF Lithography
안일신
2005-06
Determination of the Optical Functions of Various Liquids by Rotating Compensator Multichannel Spectroscopic Ellipsometry
안일신
2006-12
Single Anti-Reflection Coating Optimization with Different Polarizations for Hyper Numerical Aperture Immersion Lithography
안일신
2005-10
Rubbed Polyimide Layers Studied by Rotating Sample and Compensator Spectroscopic Ellipsometry
안일신
2005-08
Line-Width Variation with Absorber Thickness in Extreme Ultraviolet Lithography
안일신
2005-07
Lens Aberration Effect on the Line Width for Different Pattern Shapes and Duty Ratios
안일신
previous
1
2
3
4
next
Discover
-Subject
6
ellipsometry
4
Ellipsometry
3
lithography
3
Navier-Stokes equation
2
32 nm line and space half-pitch
2
bias
2
haze
2
optical proximity correction (OPC)
2
Resist reflow process
2
resist reflow process
next >
-Date issued
12
2008
3
2007
13
2006
7
2005
BROWSE
Communities & Collections
Titles
Authors