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Evaluation of Partial Coherent Imaging Using the Modulation Transfer Function in Immersion Lithography

Title
Evaluation of Partial Coherent Imaging Using the Modulation Transfer Function in Immersion Lithography
Author
안일신
Issue Date
2006-07
Publisher
한국물리학회
Citation
JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v. 49, No. 1, Page. 246-252
Abstract
Immersion lithography has been actively pursued as a method of extending the resolution of optical lithography beyond the 65 nm mode. Immersion lithography and the hyper numerical aperture impact the selection and optimization of various resolution enhancement techniques. These can be selected, as appropriate, for each mask pattern. When the line width on target is narrower, the fine line structure will no longer be discernible. Then, this is the resolution limit of the system. Until recent times, the traditional means of determining the quality of an optical element or system of elements was to evaluate its limit of resolution. A useful parameter in evaluating the performance of a system is the modulation transfer function, and this is analyzed for the hyper numerical aperture immersion lithography.
URI
http://www.jkps.or.kr/journal/view.html?uid=7825&vmd=Fullhttp://repository.hanyang.ac.kr/handle/20.500.11754/108327
ISSN
0374-4884; 1976-8524
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > PHOTONICS AND NANOELECTRONICS(나노광전자학과) > Articles
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