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COLLEGE OF ENGINEERING[S](공과대학)
MATERIALS SCIENCE AND ENGINEERING(신소재공학부)
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Results 11-19 of 19 (Search time: 0.004 seconds).
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Issue Date
Title
Author(s)
2015-03
Characteristics of a nickel thin film and formation of nickel silicide by using remote plasma atomic layer deposition with Ni( (i) Pr-DAD)(2)
전형탁
2014-11
Plasma-enhanced atomic layer deposition (PEALD) of cobalt thin films for copper direct electroplating
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2016-01
Characteristics of Al2O3/ZrO2 laminated films deposited by ozone-based atomic layer deposition for organic device encapsulation
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2016-11
The effect of ozone concentration during atomic layer deposition on the properties of ZrO2 films for capacitor applications
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2021-04
Characteristics of Silicon Oxide Thin Film Deposited via Remote Plasma Atomic Layer Deposition
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2022-03
Deposition of the tin sulfide thin films using ALD and a vacuum annealing process for tuning the phase transition
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2022-05
The effect of O2 plasma post-treatment on atomic layer deposited TiO2 thin films
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2020-09
Tuning properties of SnO2/Au/SnO(2)multilayer with variable Au thicknesses as transparent conductive oxides
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2020-02
Effect of single Al2O3 cycle insertion with various positions in SnO2 thin films using atomic layer deposition
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ZrO2
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Adhesion
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Al2O3
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Annealing
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Auger electron spectroscopy
1
BOE solution
1
CCTBA
1
Cobalt
1
Copper interconnect
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Dielectrics
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-Date issued
6
2020 - 2022
13
2011 - 2019
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