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Characteristics of Al2O3/ZrO2 laminated films deposited by ozone-based atomic layer deposition for organic device encapsulation

Title
Characteristics of Al2O3/ZrO2 laminated films deposited by ozone-based atomic layer deposition for organic device encapsulation
Author
전형탁
Keywords
Thin film encapsulation; Ozone; Atomic layer deposition; Al2O3; ZrO2; Laminated films; WVTR
Issue Date
2016-01
Publisher
ELSEVIER SCIENCE SA
Citation
THIN SOLID FILMS, v. 599, Page. 119-124
Abstract
We investigated the characteristics of 100 nm-thick Al2O3/ZrO2 laminated films grown by ozone (O-3)-based atomic layer deposition (ALD) at low temperature (100 degrees C) as thin film encapsulation (TFE). Calcium (Ca) test was performed at a relative humidity (RH) of 50% with a temperature of 50 degrees C to derive the water vapor transmission rates (WVTRs) of aluminum oxide (Al2O3)-, zirconium oxide (ZrO2)-, and Al2O3/ZrO2-laminated films. Al2O3/ZrO2-laminated films exhibited better permeation barrier properties than Al2O3 or ZrO2 single layer films. In Al2O3/ZrO2 laminated films, permeation barrier properties improved as the number of alternating layers increased. Permeation barrier properties were closely related to the number of interfaces because of the ZrAlxOy phase that formed at the interface between the Al2O3 and ZrO2 sublayers. The ZrAlxOy phase was denser than single layers of Al2O3 and ZrO2 and had a homogeneous amorphous structure. The formation of a ZrAlxOy phase in Al2O3/ZrO2 laminated film effectively improved the permeation barrier properties of the film. (C) 2015 Elsevier B.V. All rights reserved.
URI
http://www.sciencedirect.com/science/article/pii/S0040609015012948?via%3Dihub
ISSN
0040-6090
DOI
10.1016/j.tsf.2015.12.044
Appears in Collections:
COLLEGE OF ENGINEERING[S](공과대학) > MATERIALS SCIENCE AND ENGINEERING(신소재공학부) > Articles
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