2017-05 | The effects of process temperature on the work function modulation of ALD HfO2 MOS device with plasma enhanced ALD TiN metal gate using TDMAT precursor | 최창환 |
2017-04 | The Effects of Substrate Temperature on the Properties of Kesterite Cu2ZnSnS4 Thin Films Deposited Using a Single Quaternary Target | 최창환 |
2012-10 | The electrical and structural properties of HfO2/SrTiO3 stacked gate dielectric with TiN metal gate electrode | 최창환 |
2015-11 | Electrical characteristics of ALD La2O3 capping layers using different lanthanum precursors in MOS devices with ALD HfO2, HfSiOx, and HfSiON gate dielectrics | 최창환 |
2021-11 | Emulating synaptic plasticity and resistive switching characteristics through amorphous Ta2O5 embedded layer for neuromorphic computing | 최창환 |
2018-08 | Engineering synaptic characteristics of TaOx/HfO2 bi-layered resistive switching device | 최창환 |
2012-08 | Fabrication, structure, and photoluminescence of GeO2/ZnO core-shell nanorods | 최창환 |
2017-09 | Fermi-Level Unpinning Technique with Excellent Thermal Stability. for n-Type Germanium | 최창환 |
2015-09 | Fermi-Level Unpinning Using a Ge-Passivated Metal-Interlayer-Semiconductor Structure for Non-Alloyed Ohmic Contact of High-Electron-Mobility Transistors | 최창환 |
2020-11 | Filamentary and interface switching of CMOS-compatible Ta2O5 memristor for non-volatile memory and synaptic devices | 최창환 |
2019-10 | Gate Voltage Dependence of Low Frequency Noise in Tunneling Field Effect Transistors | 최창환 |
2012-10 | Growth of single crystal GaAs nanowires by a surface diffusion-mediated solid-liquid-solid process | 최창환 |
2016-08 | High-Performance 2D Rhenium Disulfide (ReS2) Transistors and Photodetectors by Oxygen Plasma Treatment | 최창환 |
2016-06 | A High-Performance WSe2/h-BN Photodetector using a Triphenylphosphine (PPh3)-Based n-Doping Technique | 최창환 |
2019-10 | Highly Sensitive and Full Range Detectable Humidity Sensor using PEDOT:PSS, Methyl Red and Graphene Oxide Materials | 최창환 |
2019-11 | Hot-Carrier Degradation Estimation of a Silicon-on-Insulator Tunneling FET Using Ambipolar Characteristics | 최창환 |
2011-03 | Impact of diffusionless anneal using dynamic surface anneal on the electrical properties of a high-k/metal gate stack in metal-oxide-semiconductor devices | 최창환 |
2022-06 | Improved analog switching characteristics of Ta2O5-based memristor using indium tin oxide buffer layer for neuromorphic computing | 최창환 |
2015-01 | Improved high temperature integration of Al2O3 on MoS2 by using a metal oxide buffer layer | 최창환 |
2017-05 | Improved performance of gate-last FDSOI tunnel field-effect-transistors (TFETs) with modulating Al2O3 composition in atomic layer deposited HfAlOx gate dielectrics | 최창환 |
2019-08 | Improved resistive switching and synaptic characteristics using Ar plasma irradiation on the Ti/HfO2 interface | 최창환 |
2021-01 | Improved switching and synapse characteristics using PEALD SiO2 thin film in Cu/SiO2/ZrO2/Pt device | 최창환 |
2016-10 | Improvement of the short channel effect in PMOSFETs using cold implantation | 최창환 |
2018-09 | In situ dry cleaning of Si wafer using OF2/NH3 remote plasma with low global warming potential | 최창환 |
2013-10 | Influence of Different Annealing Ambients on the Properties of Zinc Sulfide Prepared by Atomic Layer Deposition | 최창환 |
2018-11 | Influence of in-situ NH3 plasma passivation on the electrical characteristics of Ga-face n-GaN MOS capacitor with atomic layer deposited HfO2 | 최창환 |
2018-03 | Influence of oxygen vacancies in ALD HfO2-x thin films on non-volatile resistive switching phenomena with a Ti/HfO2-x/Pt structure | 최창환 |
2018-02 | Interface engineering of ALD HfO2-based RRAM with Ar plasma treatment for reliable and uniform switching behaviors | 최창환 |
2019-10 | Investigation of Positive Bias Temperature Instability Characteristics of Fully Depleted Silicon on Insulator Tunneling Field Effect Transistor with High-k Dielectric Gate Stacks | 최창환 |
2016-09 | Kesterite Cu2ZnSnS4 (CZTS) Thin Film Formation Using Sequential Annealing Process Under N-2 and H2S Atmosphere | 최창환 |