Study on the Complexing Agents Reaction in Electrochemical Deposition of Iron Phosphorus Alloy Thin Films

Abstract

As long as the expeditious development of information processing and power electronics technology, all sort of electrical equipments are demanded that high frequency, miniaturization and energy saving. Due to the characterization of low coercivity and high permeability, soft magnetic amorphous alloys have been used in various industrial fields such as high frequency inductor core, transformer core, sensor, and electromagnetic wave shielding sheets. In particular, much research has been actively conducted on Fe-based soft magnetic amorphous alloys at low cost. To improve the amorphous structure, the alloy design of the Fe-based soft magnetic alloy is conducted by adding metalloid element with small atomic radius. To increase improve saturated magnetic flux density with keeping coercivity low, nanocrystalline alloys have been studied by many researchers. In this paper, the alloy design of Fe-P composition was carried out.The Fe-P alloys were prepared that is thin film by electrochemical deposition. According to the concetration of complexing agents, the change of surface state and metalloid phosphorus contents were investigated by using SEM and ICP analysis. This study was performed to analyze that content of metalloid P depending on increase complexing agent affects crystallization behavior and grain size. And grain size was calculated by Scherrer equation based on XRD data. In addition, VSM analysis was shown that the change of magnetic properties are depending on the metalloid phosphorus contents increases.