Full metadata record
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 오혜근 | - |
dc.date.accessioned | 2018-04-10T01:55:10Z | - |
dc.date.available | 2018-04-10T01:55:10Z | - |
dc.date.issued | 2016-03 | - |
dc.identifier.citation | Proceedings Volume 9776, Extreme Ultraviolet (EUV) Lithography VII; 97762J (2016), Page. 1-6 | en_US |
dc.identifier.isbn | 9781510600119 | - |
dc.identifier.issn | 1996-756X | - |
dc.identifier.issn | 0277-786X | - |
dc.identifier.uri | https://www.spiedigitallibrary.org/conference-proceedings-of-spie/9776/1/Feasibility-of-a-new-absorber-material-for-high-NA-extreme/10.1117/12.2219576.full?SSO=1 | - |
dc.identifier.uri | http://hdl.handle.net/20.500.11754/65533 | - |
dc.description.abstract | The extreme-ultraviolet lithography (EUVL) has been regarded as the best candidate to achieve high resolution patterning below 1x nm node. From the Rayleigh criterion, a numerical aperture (NA) should be increased to make the high resolution pattern. A new absorber structure which has sufficient image contrast and small height is needed for realization of high NA optics. In this study, 28 nm-thick ruthenium oxide (RuO2) is suggested for the absorber material. We could obtain higher image contrast and better H-V bias by using the RuO2 absorber compared to the other materials such as TaN and TaBN. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | SPIE | en_US |
dc.subject | EUVL | en_US |
dc.subject | high NA | en_US |
dc.subject | PSM | en_US |
dc.subject | thin absorber | en_US |
dc.title | Feasibility of a new absorber material for high NA extreme ultraviolet lithography | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1117/12.2219576 | - |
dc.relation.page | 1-6 | - |
dc.contributor.googleauthor | Ko, K.H | - |
dc.contributor.googleauthor | Oh, H.K | - |
dc.sector.campus | E | - |
dc.sector.daehak | COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E] | - |
dc.sector.department | DEPARTMENT OF APPLIED PHYSICS | - |
dc.identifier.pid | hyekeun | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.