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COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학)
APPLIED PHYSICS(응용물리학과)
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Issue Date
Title
Author(s)
2004-05
Aerial image characterization for the defects in the extreme ultraviolet mask
오혜근
2005-03
Line width variation with absorber thickness in extreme ultraviolet lithography
오혜근
2008-02
The study of attenuated PSM structure for extreme ultra violet lithography with minimized mask shadowing effect(
오혜근
2002-10
Bulk Image Formation of Scalar Modeling in a Photoresist
오혜근
2003-02
Prediction of the Critical Dimensions by Using a Threshold Energy Resist Model
오혜근
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Horizontal-vertical CD bias
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Lithography
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Mask absorber
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Mask thickness
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Multilayer defect
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Near field
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OPC
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Projection lens system
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Resist model
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Scalar model
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