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Aerial image characterization for the defects in the extreme ultraviolet mask

Title
Aerial image characterization for the defects in the extreme ultraviolet mask
Author
오혜근
Keywords
Aerial image; EUV lithography; EUV mask; Multilayer defect
Issue Date
2004-05
Publisher
SPIE
Citation
Proceedings of SPIE - The International Society for Optical Engineering, v. 5374, No. PART 2, Page. 751-759
Abstract
Simulation has been used to predict the aerial images for masks with defect free multilayer and with defect in multilayer. Mask defects are easily produced in extreme ultraviolet lithography mask fabrication process because 40 Mo/Si multilayer films are stacked and each stack is made from 2 to 4 run. In this case, multilayer can be stacked with defects and with slightly different heights. It is hard to achieve an aerial image which we want to get. This paper discusses various image properties when there are no defects and when there are different kinds of defects on multilayer. The results were calculated by using SOLID-EUV of Simga-C. The aerial images caused by defects on the multilayer are characterized.
URI
https://repository.hanyang.ac.kr/handle/20.500.11754/132071https://www.spiedigitallibrary.org/conference-proceedings-of-spie/5374/1/Aerial-image-characterization-for-the-defects-in-the-extreme-ultraviolet/10.1117/12.534851.short
ISSN
0277-786X
DOI
10.1117/12.534851
Appears in Collections:
COLLEGE OF SCIENCE AND CONVERGENCE TECHNOLOGY[E](과학기술융합대학) > APPLIED PHYSICS(응용물리학과) > Articles
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