2008-03 | Characteristics of Negative Electron Beam Resists, ma-N2410 and ma-N2405 | 정희준 |
2005-04 | Chirp Parameter of Electroabsorption Modulators with InGaAsP Intrastep Quantum Wells | 정희준 |
2006-11 | Chromeless Phase Lithography Using Scattering Bars and Zebra Patterns | 정희준 |
2010-12 | Coherent Tunneling Transport in Molecular Junctions | 정희준 |
2005-12 | A compensation of Young's modulus in polysilicon structure with discontinuous material distribution | 정희준 |
2009-11 | Conduction mechanism of leakage current due to the traps in ZrO2 thin film | 정희준 |
2014-12 | Current Fluctuations in a Semiconductor Quantum Dot with Large Energy Spacing | 정희준 |
2014-12 | Current Transport Analysis of ZrO2 Thin Films: Effects of Post-deposition Annealing | 정희준 |
2008-12 | E-beam Lithography를 이용한 3차원 Air-bridge 구조의 제작기법 | 정희준 |
2016-08 | Electrical Characteristics of Benzenedithiol versus Methylbenzenthiol Self-Assembled Monolayers in Multilayer Graphene-Electrode Molecular Junctions | 정희준 |
2016-02 | Electrical characterization of benzenedithiolate molecular electronic devices with graphene electrodes on rigid and flexible substrates | 정희준 |
2008-08 | Ellipsometry for Pellicle-Covered Surface | 정희준 |
2009-04 | Fabrication and Shot Noise Characteristics of Ultra-Small Split-Gate GaAs Quantum Dots | 정희준 |
2005-02 | Fabrication of Quantum Well Infrared Photodetectors using Chemically Wet-Etched Grid Nanostructures | 정희준 |
2014-06 | Flexible Molecular-Scale Electronic Devices Composed of Diarylethene Photoswitching Molecules | 정희준 |
2007-05 | Growth behaviour of ZnO thin films and nanowires on SrTiO3 substrates | 정희준 |
2009-02 | Integrated Electroabsorption Modulator/Heterojunction Phototransistor for Passive-Picocell Radio-Over-Fiber Applications | 정희준 |
2011-05 | Intrinsic charge transport of conjugated organic molecules in electromigrated nanogap junctions | 정희준 |
2015-02 | Investigation of inelastic electron tunneling spectra of metal-molecule-metal junctions fabricated using direct metal transfer method | 정희준 |
2006-11 | Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography | 정희준 |