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COLLEGE OF ENGINEERING SCIENCES[E](공학대학)
MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과)
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Results 1-4 of 4 (Search time: 0.001 seconds).
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2018-06
Comparative Study of the Growth Characteristics and Electrical Properties of Atomic-Layer-Deposited HfO2 Films obtained from Metal Halide and Amide Precursors
김우희
2018-06
Effects of Nb nanopin electrode on resistive random-access memory switching characteristics of NiO thin films
김우희
2018-10
Area-selective Atomic Layer Deposition using Si Precursors as Inhibitors
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2018-10
The Effects of Ar Addition to O2 Plasma on the Plasma-Enhanced Atomic Layer Deposition of Oxide Thin Films
김우희
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ALD
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atomic layer deposition
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enhanced growth rates
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ENHANCEMENT
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GATE DIELECTRICS
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GAUSSIAN-BASIS SETS
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