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COLLEGE OF ENGINEERING SCIENCES[E](공학대학)
MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과)
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Author(s)
2016-03
Electrical and physicochemical properties of atomic-layer-deposited HfO2 film on Si substrate with interfacial layer grown by nitric acid oxidation
박태주
2017-04
Electrical Characteristics of SiO2/4H-SiC Metal-oxide-semiconductor Capacitors with Low-temperature Atomic Layer Deposited SiO2
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2020-12
Direct Evidence of Electronic Interaction at the Atomic-Layer-Deposited MoS2 Monolayer/SiO2 Interface
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2020-10
Superior atomic layer deposition of conformal ZnO shell on spherical SiO2 particles for enhanced photocatalytic activity
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2020-12
Direct Evidence of Electronic Interaction at the Atomic-Layer-Deposited MoS2Monolayer/SiO2Interface
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ALD
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electronic structure
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interface
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MoS2
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synchrotron X-ray photoelectron s...
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van der Waals interaction
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X-ray absorption spectroscopy
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C-V
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effective oxide charge density
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