| 2018-01 | Mask Materials and Designs for Extreme Ultra Violet Lithography | 안진호 |
| 2019-09 | Material design for Ge2Sb2Te5 phase-change material with thermal stability and lattice distortion | 안진호 |
| 2015-04 | Mechanical deflection of a free-standing pellicle for extreme ultraviolet lithography | 안진호 |
| 2020-03 | Memory Operations of Zero Impact Ionization, Zero Subthreshold Swing FET Matrix Without Selectors | 안진호 |
| 2014-12 | Metal-HfO2-Ge capacitor: Its enhanced charge trapping properties with S-treated substrate and atomic-layer-deposited HfO2 layer | 안진호 |
| 2021-12 | Microstructures of Hfox films prepared via atomic layer deposition using Ua(NO3)3·6H2O oxidants | 안진호 |
| 2021-11 | Nano-polycrystalline Ag-doped ZnO layer for steep-slope threshold switching selectors | 안진호 |
| 2013-07 | Nanolithography on Graphene by Using Scanning Tunneling Microscopy in a Methanol Environment | 안진호 |
| 2014-11 | Nanopatterned yttrium aluminum garnet phosphor incorporated film for high-brightness GaN-based white light emitting diodes | 안진호 |
| 2014-03 | Nanopatterned yttrium aluminumgarnet phosphor incorporated filmfor high-brightness GaN-based white light emitting diodes high-brightness GaN-based white light emitting diodes | 안진호 |
| 2011-06 | Nanosize Patterning with Nanoimprint Lithography Using Poly(vinyl alcohol) Transfer Layer | 안진호 |
| 2021-07 | A new route of synthesizing atomically thin 2D materials embedded in bulk oxides | 안진호 |
| 2017-01 | Nickel and nickel oxide thin films as absorber layer materials of extreme ultraviolet masks | 안진호 |
| 2020-03 | Ozone based high-temperature atomic layer deposition of SiO2 thin films | 안진호 |
| 2019-10 | Performance of Extreme Ultraviolet Coherent Scattering Microscope | 안진호 |
| 2016-09 | Phase Shift Mask to Compensate for Mask 3D Effect in High-Numerical-Aperture Extreme Ultraviolet Lithography | 안진호 |
| 2019-12 | Plasma Etching of SiO2 with CF3I Gas in Plasma-Enhanced Chemical Vapor Deposition Chamber for In-Situ Cleaning | 안진호 |
| 2021-03 | Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiNx Films Using Trichlorodisilane for Etch-Resistant Coatings | 안진호 |
| 2013-04 | Raman spectroscopic image analysis on micropatterned graphene | 안진호 |
| 2018-06 | Removal of EUV exposed hydrocarbon from Ru capping layer of EUV mask using the mixture of alkaline solutions and organic solvents | 안진호 |
| 2012-11 | Removing graphite flakes for preparing mechanically exfoliated graphene sample | 안진호 |
| 2015-09 | Resistive Switching Characteristics of Atomic-Layer-Deposited Y2O3 Insulators with Deposition Temperature | 안진호 |
| 2015-07 | Roughening of Polyimide Surface for Inkjet Printing by Plasma Etching Using the Polyimide Masked with Polystyrene Nanosphere Array | 안진호 |
| 2015-09 | SRAF를 적용한 극자외선 노광기술용 위상 변위 마스크의 반사도에 따른 이미징 특성 연구 | 안진호 |
| 2013-08 | Stochastic Patterning Simulation Using Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography | 안진호 |
| 2011-12 | Structure, Raman, and photoluminescence properties of SnO2/MgO core-shell nanowires | 안진호 |
| 2016-09 | Sub-Resolution Assist Feature in Attenuated Phase-Shift Mask for Extreme Ultraviolet Lithography | 안진호 |
| 2014-08 | Substrate effects on the transmittance of 1D metal grid transparent electrodes | 안진호 |
| 2012-02 | Suppressed Thermally Induced Flatband Voltage Instabilities with Binary Noble Metal Gated Metal-Oxide-Semiconductor Capacitors | 안진호 |
| 2019-09 | Synthesis of Ag-ZnO core-shell nanoparticles with enhanced photocatalytic activity through atomic layer deposition | 안진호 |
