Collapse behavior and forces of multistack nanolines
- Title
- Collapse behavior and forces of multistack nanolines
- Author
- 박진구
- Issue Date
- 2010-01
- Publisher
- Institute of Physics Publishing
- Citation
- Nanotechnology, v. 21, NO. 1, article no. 015708, Page. 1-7
- Abstract
- Two types of multistack nanolines (MNLs), Si-substrate (Si)/siliconoxynitride (SiON)/amorphous Si (a-Si)/SiO2 and Si/SiO2/polycrystalline Si (poly-Si)/SiO2 were used to measure the collapse force and to investigate their collapse behavior by an atomic force microscope (AFM). The Si/SiON/a-Si/SiO2 MNL showed a larger length of fragment in the collapse patterns at a smaller collapse force. The Si/SiO2/poly-Si/SiO2 MNL, however, demonstrated a smaller length of fragment at a higher applied collapse force. The collapse forces increased by the square of the linewidth in both Si/SiON/a-Si/SiO2 and Si/SiO2/poly-Si/SiO2 MNLs. Once an AFM tip touches an Si/SiON/a-Si/SiO2 line, which is a softer MNL, it was delaminated first at the Si/SiON interface. One end of the delaminated line was first broken and then the other end was bent until it was broken. A harder MNL, Si/SiO2/poly-Si/SiO2, however, was broken at two ends simultaneously after the delamination occurred at the Si/SiO2/poly-Si interface. The different collapse behaviors were attributed to the magnitude of adhesion forces at the stack material interfaces and the mechanical strength of MNLs.
- URI
- https://iopscience.iop.org/article/10.1088/0957-4484/21/1/015708https://repository.hanyang.ac.kr/handle/20.500.11754/181250
- ISSN
- 0957-4484;1361-6528
- DOI
- 10.1088/0957-4484/21/1/015708
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MATERIALS SCIENCE AND CHEMICAL ENGINEERING(재료화학공학과) > Articles
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