Computational fluid dynamics analysis of particle deposition induced by a showerhead electrode in a capacitively coupled plasma reactor
- Title
- Computational fluid dynamics analysis of particle deposition induced by a showerhead electrode in a capacitively coupled plasma reactor
- Author
- 김호준
- Keywords
- showerhead electrode; capacitively coupled plasma; plasma-enhanced chemical vapor deposition; computational fluid dynamics; particle transport; fluid simulation; hydrogenated amorphous silicon
- Issue Date
- 2021-08
- Publisher
- MDPI
- Citation
- COATINGS; AUG 2021, 11 8, p1004 16p.
- Abstract
- Defect formation in the deposition of thin films for semiconductors is not yet sufficiently
understood. In a showerhead-type capacitively coupled plasma (CCP) deposition reactor, the
showerhead acts as both the gas distributor and the electrode. We used computational fluid dynamics
to investigate ways to enhance cleanliness by analyzing the particle deposition induced by the
showerhead electrode in a CCP reactor. We analyzed particle transport phenomena using a threedimensional complex geometry, whereas SiH4/He discharges were simulated in a two-dimensional
simplified geometry. The process volume was located between the RF-powered showerhead and
the grounded heater. We demonstrated that the efficient transportation of particles with a radius
exceeding 1 µm onto the heater is facilitated by acceleration inside the showerhead holes. Because
the available space in which to flow inside the showerhead is constricted, high gas velocities within
the showerhead holes can accelerate particles and lead to inertia-enhanced particle deposition. The
effect of the electrode spacing on the deposition of particles generated in plasma discharges was also
investigated. Smaller electrode spacing promoted the deposition of particles fed from the showerhead
on the heater, whereas larger electrode spacing facilitated the deposition of particles generated in
plasma discharges on the heater.
- URI
- https://www.proquest.com/docview/2565056700?accountid=11283https://repository.hanyang.ac.kr/handle/20.500.11754/172456
- ISSN
- 20796412
- DOI
- 10.3390/coatings11081004
- Appears in Collections:
- COLLEGE OF ENGINEERING SCIENCES[E](공학대학) > MECHANICAL ENGINEERING(기계공학과) > Articles
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