Megasonic cleaning is one of the promising technologies to remove the particles during
semiconductor processing. Acoustic bubble cavitation plays a key role in removing the particles. In
this work, the effect of an anionic surfactant sodium dodecyl sulfate (SDS) on a bubble in the presence
of hydrogen dissolved DIW water was studied. The bubble dynamics were observed using a highspeed camera. It was found that with the increase of surfactant the bubble characteristics were
changed very significantly. Several parameters affecting the bubble dynamics were investigated.